Table of Sputtering target
1.Target for optical film
Applications
- Low-Emissivity film for surface-treated glass for vehicle and building
- Films for displays and anti-reflective film for glass
- Optical adjustable film for touch panel (index matching film)
- Optical multi-layer film for glass for information electronics (mirrors of CD's and DVD's)
Material |
Product name |
Shape of target |
Target |
Film( in case of oxidation film) |
Plate |
Cylinder |
DC Sputtering |
Characteristics |
Alkaline-resistant |
Acid-resistant |
Scratch resistance |
Others |
Si type |
SC |
○ |
|
○ |
Rapid film deposition (>crystal Si )
High strength Rapid film deposition、high thermal conductivity |
○ |
○ |
○ |
n=1.46
Amorphous |
Si thermal spray type |
○ |
○ |
○ |
Stable discharge |
○ |
○ |
○ |
n=1.46
Amorphous |
Nb type |
NBO |
○ |
○
Thermal spray |
○ |
High strength Rapid film deposition
Rapid film deposition(>Nb) |
○ |
○ |
○ |
n=2.3
Amorphous |
Ti type |
TXO |
○ |
○
Thermal spray |
○ |
Rapid film deposition(>Ti) |
○ |
○ |
○ |
n=2.45
Amorphous |
The data (in this catalog) represents typical values and should not be considered as guaranteed specifications. These typical values can be varied without any notice.
Characteristics
SC
- Realizes long and stable electric discharge due to its properties of high strength, high thermal conductivity and homogeneous matrix.
- Speed of deposition is higher more than 20% compared with that of crystal Si.
- Amorphous SiO2 film is gained by oxidation-reactive sputtering.
- Film gained by oxidation-reactive sputtering is non-colored with high transparency.
NBO
- More than 3 times of higher deposition speed is possible with NBO compared with that of metal Nb.
- Amorphous Nb2O5 film is gained by oxidation-reactive sputtering.
- The film gained by oxidation-reactive sputtering is non-colored with high transparency.
TXO
- More than 7 times of higher deposition speed is possible with TXO compared with that of metal Ti.
- Amorphous TiO2 films are gained by oxidation-reactive sputtering.
- The film gained by oxidation-reactive sputtering is non-colored with high transparency.
2.Target for high-durability protective film・Target for middle refraction rate film
Applications
- Protective film of surface-treated glass (colored glass, IR reflecting glass) for vehicle and housing.
- Anti-reflective film for films for displays (touch-panels and others).
- Protection film with scratch resistant for barcode-readers and glass of copy-machines
- Protective film for other various film requiring alkaline resistance and scratch resistance.
Material |
Product name |
Target shape |
Target |
Film( in case oxidation film) |
Plate |
Cylinder |
DC Sputtering |
Characteristics |
Alkaline-resistant |
Acid-resistant |
Scratch resistant |
Others |
Si type |
SX |
○ |
|
○ |
High strength
Low arcing property |
◎ |
◎ |
◎ |
n=1.7
Amorphous
|
ST |
○ |
△
Under development |
○ |
High strength
Rapid film deposition(>SX) |
○ |
◎ |
◎ |
n=1.7~2.0
Amorphous |
The data (in this catalog) represents typical values and should not be considered as guaranteed specifications. These typical values can be varied without any notice.
Characteristic
SX
- Amorphous film with flat and abrasion resistant generated by oxidation-reactive sputtering.
- Film gained by oxidation-reactive sputtering is non-colored and with high transparency.
- Film gained by oxidation-reactive sputtering is excellent in resistance to scratch and chemicals.
ST
- Deposition speed is possible comparison to the SX.
- Amorphous film generated by oxidation-reactive sputtering is flat and abrasion resistant.
- Film gained by oxidation-reactive sputtering is non-colored and with high transparency.
- Film gained by oxidation-reactive sputtering is excellent in resistance to scratch and chemicals.
- Film gained by oxidation-reactivity sputtering is anti-drop property.
- Refractive index of film is adjustable from “1.7” to "2.0" by varying the composition of target.
3.Target for dielectric film for Low-E・Target for middle refraction rate film
Application
- Dielectric film for Low-E (Low-Emissivity) for building material
- Optical middle refraction rate film for anti-reflective film and so on
Material |
Product name |
Target shape |
Target |
Film quality |
Plate |
Cylinder |
DC Deposition |
Characteristics |
Zn type |
SZ |
○ |
○ |
○ |
Alloy Target
Ar deposition |
n=2.0
Amorphous |
AZ |
○ |
△
Under development |
○ |
Alloy Target
Ar deposition |
n=2.0
Amorphous |
The data (in this catalog) represents typical values and should not be considered as guaranteed specifications. These typical values can be varied without any notice.
Characteristic
- Cylinder SZ target developed by our own method (RP method: Patent applied for) realized high adhesive strength with the backing tube. Therefore, with high power sputtering, rapid deposition higher than that of conventional thermal spray method is possible.
- Long size of cylinder shape, with more than 3m in length, is possible to produce.
4.Target for transparent conductive film
Application
- Transparent electrode for glass for environment and energy purposes (such as solar cell)
- Transparent electrode for glass for displays (PDP, LCD)
- Transparent conductive film for glass for vehicle and building (such as heat ray reflection glass, heat generating surface of electric car)
- Anti-static coating film for fibers and films
Material |
Product name |
Target shape |
Target |
Film quality |
Plate |
Cylinder |
DC deposition |
Characteristics |
Conductivity |
Chemical-resistance |
Other characteristics |
Zn type |
GZO |
○ |
|
○ |
High density sintered ceramics
Ar deposition |
○ |
× |
n=1.9
Low temperature crystal film |
AZO |
○ |
△
Under development |
○ |
High density sintered ceramics
Ar deposition |
○ |
× |
n=1.9
Low temperature crystal film |
The data (in this catalog) represents typical values and should not be considered as guaranteed specifications. These typical values can be varied without any notice.
Characteristic
- High density ZnO type target with more than 90% of relative density.
- Compared with ITO, nodules are less possible to generate, and a stable electric discharge is possible.
- Deposition in pure argon atmosphere is possible.
- Crystal film formation is possible to gain even at room temperature.